MNT-HP-VG170 photolithography Hot Plate – MicroNano Tools
MNT-HP-VG170 photolithography Hot Plate – MicroNano Tools
General Introduction The MNT-HP-VG170 is a compact and easy-to-use photolithography hot plate designed for being used in a glovebox. It is used in prebake, postbake, and hardbake of the photolithographic process. This product features high baking speed, uniformity, high temperature control accuracy, and highly repeatable experimental results. Built-in vacuum ensures close contact between wafer and heating surface. Product Features - Manual controlled vacuum function ensures close contact between wafer and heating surface- High precision temperature control with digital display, ±0.2°C - Sealing lid with microcrystalline panel for heat radiation, ensuring High temperature uniformity ≤±1% - Embedded heating element, compact design, suitable for using in a inert gas glovebox - Heating surface is made from alumina, high corrosion resistance and hardness- Sealed interface between heating disk and microcrystalline panel Specifications Partial List of Recent Clients University of California in San Diego Nano3 Facility, Hewlett Packard Enterprise, Sandia
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MNT-HP-VG170 photolithography Hot Plate – MicroNano Tools
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MNT-HP-VG170 photolithography Hot Plate – MicroNano Tools
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